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- W1970997824 abstract "Recently, both PSI<sup>1</sup> and ASML<sup>2</sup> illustrated champion EUVL resolution using slow, non-chemically amplified inorganic resists. However, the requirements for EUVL manufacturing require simultaneous delivery of high resolution, good sensitivity, and low line edge/width roughness (LER/LWR) on commercial grade hardware. As a result, we believe that new classes of materials should be explored and understood. This paper focuses on our efforts to assess metal oxide based nanoparticles as novel EUV resists<sup>3</sup>. Various spectroscopic techniques were used to probe the patterning mechanism of these materials. EUV exposure data is presented to investigate the feasibility of employing inorganic materials as viable EUV resists." @default.
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- W1970997824 date "2014-04-17" @default.
- W1970997824 modified "2023-10-06" @default.
- W1970997824 title "Investigation of novel inorganic resist materials for EUV lithography" @default.
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- W1970997824 doi "https://doi.org/10.1117/12.2046677" @default.
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