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- W1971045925 abstract "Der charakteristische selbst begrenzende Wachstumsmechanismus der Atomlagenabscheidung (ALD) ermöglicht die Kontrolle der Schichtdicken im atomaren Bereich und erlaubt Beschichtungen komplexer Oberflächen. Diese Eigenschaft macht die ALD zu einer vielversprechenden Technik für die zukünftige Mikro - und Nanotechnologie. Der Schlüssel für die ALD ist die Precursorchemie. Atomic layer deposition - a tool for nanotechnology The characteristic self-limiting growth mechanism of atomic layer deposition (ALD) facilitates the control of film thickness at the atomic level and allows deposition on complex surfaces. These features make ALD to a very promising technique for future micro - and nanotechnology. The precursor chemistry is a key issue in ALD." @default.
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- W1971045925 date "2008-02-01" @default.
- W1971045925 modified "2023-10-18" @default.
- W1971045925 title "Atomlagenabscheidung als Werkzeug für die Nanotechnologie" @default.
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