Matches in SemOpenAlex for { <https://semopenalex.org/work/W1971293744> ?p ?o ?g. }
Showing items 1 to 70 of
70
with 100 items per page.
- W1971293744 abstract "As promising technologies for ArF optical lithography, CLM(Chrome-Less Mask) and alternating phase shift mask(PSM) technologies among RETs(Resolution Enhancement Techniques) for low k<sub>1</sub> have been researched worldwide for a couple of decades. Quartz dry etching has become more critical to manufacture the mask with those technologies in the ArF lithography. Alternating PSM and CLM require the formation of 180-degree phase difference by quartz dry etch. There are many error factors, which can influence CD uniformities on mask and wafers, in dry etch step such as micro-trench, depth uniformity, sidewall angle, and morphology. Furthermore, quartz depth is hard to control because there is no stopping layer for quartz etch. Micro-trench, one of the important factors on quartz etch, can drop light intensity on wafer. Therefore, micro-trench can deteriorate the RET. We investigated characteristics of micro-trench during quartz dry etch process and the influences on resolution, which can be improved by dry etch parameters." @default.
- W1971293744 created "2016-06-24" @default.
- W1971293744 creator A5009369052 @default.
- W1971293744 creator A5021509376 @default.
- W1971293744 creator A5058682362 @default.
- W1971293744 creator A5071711536 @default.
- W1971293744 creator A5086675314 @default.
- W1971293744 date "2005-06-28" @default.
- W1971293744 modified "2023-10-16" @default.
- W1971293744 title "Evaluations of optical performance for micro-trench on quartz etch in ArF lithography" @default.
- W1971293744 doi "https://doi.org/10.1117/12.617227" @default.
- W1971293744 hasPublicationYear "2005" @default.
- W1971293744 type Work @default.
- W1971293744 sameAs 1971293744 @default.
- W1971293744 citedByCount "0" @default.
- W1971293744 crossrefType "proceedings-article" @default.
- W1971293744 hasAuthorship W1971293744A5009369052 @default.
- W1971293744 hasAuthorship W1971293744A5021509376 @default.
- W1971293744 hasAuthorship W1971293744A5058682362 @default.
- W1971293744 hasAuthorship W1971293744A5071711536 @default.
- W1971293744 hasAuthorship W1971293744A5086675314 @default.
- W1971293744 hasConcept C100460472 @default.
- W1971293744 hasConcept C119599485 @default.
- W1971293744 hasConcept C120665830 @default.
- W1971293744 hasConcept C121332964 @default.
- W1971293744 hasConcept C127413603 @default.
- W1971293744 hasConcept C1291036 @default.
- W1971293744 hasConcept C155310634 @default.
- W1971293744 hasConcept C159985019 @default.
- W1971293744 hasConcept C160671074 @default.
- W1971293744 hasConcept C171250308 @default.
- W1971293744 hasConcept C192562407 @default.
- W1971293744 hasConcept C204223013 @default.
- W1971293744 hasConcept C2779227376 @default.
- W1971293744 hasConcept C2779870107 @default.
- W1971293744 hasConcept C2781345722 @default.
- W1971293744 hasConcept C49040817 @default.
- W1971293744 hasConceptScore W1971293744C100460472 @default.
- W1971293744 hasConceptScore W1971293744C119599485 @default.
- W1971293744 hasConceptScore W1971293744C120665830 @default.
- W1971293744 hasConceptScore W1971293744C121332964 @default.
- W1971293744 hasConceptScore W1971293744C127413603 @default.
- W1971293744 hasConceptScore W1971293744C1291036 @default.
- W1971293744 hasConceptScore W1971293744C155310634 @default.
- W1971293744 hasConceptScore W1971293744C159985019 @default.
- W1971293744 hasConceptScore W1971293744C160671074 @default.
- W1971293744 hasConceptScore W1971293744C171250308 @default.
- W1971293744 hasConceptScore W1971293744C192562407 @default.
- W1971293744 hasConceptScore W1971293744C204223013 @default.
- W1971293744 hasConceptScore W1971293744C2779227376 @default.
- W1971293744 hasConceptScore W1971293744C2779870107 @default.
- W1971293744 hasConceptScore W1971293744C2781345722 @default.
- W1971293744 hasConceptScore W1971293744C49040817 @default.
- W1971293744 hasLocation W19712937441 @default.
- W1971293744 hasOpenAccess W1971293744 @default.
- W1971293744 hasPrimaryLocation W19712937441 @default.
- W1971293744 hasRelatedWork W1971293744 @default.
- W1971293744 hasRelatedWork W1988026665 @default.
- W1971293744 hasRelatedWork W2007868562 @default.
- W1971293744 hasRelatedWork W2023765988 @default.
- W1971293744 hasRelatedWork W2078588669 @default.
- W1971293744 hasRelatedWork W2270301116 @default.
- W1971293744 hasRelatedWork W2350534370 @default.
- W1971293744 hasRelatedWork W2535453601 @default.
- W1971293744 hasRelatedWork W2540129203 @default.
- W1971293744 hasRelatedWork W3211935940 @default.
- W1971293744 isParatext "false" @default.
- W1971293744 isRetracted "false" @default.
- W1971293744 magId "1971293744" @default.
- W1971293744 workType "article" @default.