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• W1971572612 abstract "An effective design principle has been applied to photonic crystal waveguide bends fabricated in silicon-on-insulator material using deep UV lithography resulting in a large increase in the low-loss bandwidth of the bends. Furthermore, it is experimentally demonstrated that the absolute bandwidth range can be adjusted in a post-fabrication thermal oxidation process." @default.
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• W1971572612 date "2004-01-01" @default.
• W1971572612 modified "2023-10-18" @default.
• W1971572612 title "Bandwidth engineering of photonic crystal waveguide bends" @default.
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• W1971572612 doi "https://doi.org/10.1049/el:20046206" @default.
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