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- W1971966678 abstract "High density through silicon via (TSV) is a key in fabricating three-dimensional (3-D) large-scale integration (LSI). We have developed polycrystalline silicon (poly-Si) TSV technology and tungsten (W)/poly-Si TSV technology for 3-D integration. In the poly-Si TSV formation, low-pressure chemical vapor deposition poly-Si heavily doped with phosphorus was conformally deposited into the narrow and deep trench formed in a Si substrate after the surface of Si trench was thermally oxidized. In the W/poly-Si TSV formation, tungsten was deposited into the Si trench by atomic layer deposition method after the poly-Si deposition, where poly-Si was used as a liner layer for W deposition. The 3-D microprocessor test chip, 3-D memory test chip, 3-D image sensor chip, and 3-D artificial retina chip were successfully fabricated by using poly-Si TSV." @default.
- W1971966678 created "2016-06-24" @default.
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- W1971966678 date "2009-01-01" @default.
- W1971966678 modified "2023-10-05" @default.
- W1971966678 title "High-Density Through Silicon Vias for 3-D LSIs" @default.
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- W1971966678 doi "https://doi.org/10.1109/jproc.2008.2007463" @default.
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