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- W1972250596 abstract "A method to design a reactive sputtering process with stoichiometric deposition and no hysteresis is developed. This method is a further development of the model based on mass, energy and entropy balances. The results of numerical simulation are compared to experimental data available in the literature for the Ti reactive sputtering process in the presence of N2 in an Ar atmosphere." @default.
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- W1972250596 title "Method to design stoichiometric deposition reactive sputtering without hysteresis" @default.
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