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• W1972333131 abstract "Nanocrystalline silicon (nc-Si) thin films were deposited on glass and polytetrafluoroethylene (PTFE, teflon) substrates using Radio frequency (RF) magnetron sputtering. The effect of RF power and deposition temperature on the physical and structural properties of nc-Si on the glass and Teflon substrate was studied. The thin films properties were examined by Raman spectroscopy and field emission scanning electron microscopy (FESEM). We found that the thickness of thin films increased with increased RF power and deposition temperature. Raman spectroscopy results it showed that, with increasing RF power and deposition temperature can cause the changing of crystallinity on both glass and Teflon substrate." @default.
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• W1972333131 date "2012-10-01" @default.
• W1972333131 modified "2023-09-27" @default.
• W1972333131 title "Crystalline and Structural Properties Dependence on RF Power and Deposition Temperature of Sputtered Nanocrystalline Silicon Thin Films on Teflon and Glass Substrates" @default.
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• W1972333131 doi "https://doi.org/10.4028/www.scientific.net/amr.576.475" @default.
• W1972333131 hasPublicationYear "2012" @default.
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