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- W1972553297 abstract "Abstract We have investigated the sputtering processes of a Cu 2 S target in an Ar atmosphere to produce thin films. The study of the plasma was carried out by means of glow disharge optical and mass spectroscopies (GDOS and GDMS) combined with deposition rate measurements, X-ray diffraction analysis and electrical properties of the films. A preferential sulphur extraction mechanism was responsible for a transient behaviour in deposition rate and physical properties of the films. A stationary state was reached after 80 min sputtering of a mechanically cleaned Cu 2 S target. The films showed a resistivity of 5×10 −3 Ω cm and djurleite structure." @default.
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- W1972553297 date "1987-01-01" @default.
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- W1972553297 title "Sputtering process of Cu2S in an Ar atmosphere" @default.
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- W1972553297 doi "https://doi.org/10.1016/0042-207x(87)90328-9" @default.
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