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- W1972649498 abstract "Amorphous xGeO2–1-xSiO2 thin films exhibit large negative index changes (4–8%) in the high GeO2 region x>?0.25 on irradiation with ArF laser pulses. The sign of the index change is opposite the low GeO2 region X<0.25, and the magnitude of the index change is larger by an order of magnitude than that reported so far. Cross-sectional transmission electron microscope observation has revealed that nanometer-scale phase separation is induced in these highly photosensitive glasses by irradiation with ArF excimer laser light pulses or electron beams. This is a first finding of microphase separation in SiO2–GeO2 glasses by irradiation and provides an essential constraint on the modeling of photonic effects induced by irradiation in these glasses." @default.
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- W1972649498 date "1999-10-01" @default.
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- W1972649498 title "High photosensitivity and nanometer-scale phase separation in GeO_2–SiO_2 glass thin films" @default.
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- W1972649498 doi "https://doi.org/10.1364/ol.24.001352" @default.
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