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- W1972741715 abstract "We have used a kinetic model to investigate the influence of changing the pressure (0.1–0.8 Torr) and power (100–300 W) on the non-equilibrium plasma chemistry of RF (13.56 MHz) produced C2H2 (1%)/H2/Ar plasmas of interest for the synthesis of nanodiamond thin films. We found that the concentrations of the species , C2 (a 3Πu) and C2H are not sensitive to variations in the power but they exhibit a significant increase when the pressure decreases at high argon content in the plasma. In addition, the concentrations of C2H2, CH4 and CH3 exhibit a slight (case of C2H2) or negligible (case of CH3 and CH4) power-dependence although they decrease (case of C2H2 and CH4) or remain almost constant (case of CH3) as the pressure decreases. A reasonable agreement is found when comparing the model predictions with available experimental results. These findings provide a basic understanding of the plasma chemistry of hydrocarbon/Ar-rich plasma environments and, at the same time, can be of interest to optimize the processing conditions of nanodiamond films from medium pressure RF hydrocarbon/Ar-rich plasmas." @default.
- W1972741715 created "2016-06-24" @default.
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- W1972741715 date "2003-11-14" @default.
- W1972741715 modified "2023-09-27" @default.
- W1972741715 title "Influence of the pressure and power on the non-equilibrium plasma chemistry of C<sub>2</sub>, C<sub>2</sub>H, C<sub>2</sub>H<sub>2</sub>, CH<sub>3</sub>and CH<sub>4</sub>affecting the synthesis of nanodiamond thin films from C<sub>2</sub>H<sub>2</sub>(1%)/H<sub>2</sub>/Ar-rich plasmas" @default.
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- W1972741715 doi "https://doi.org/10.1088/0963-0252/13/1/007" @default.
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