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- W1972995554 endingPage "G10" @default.
- W1972995554 startingPage "G10" @default.
- W1972995554 abstract "Electropolishing of thin films poses additional challenges in comparison to bulk material polishing. The existence of a resistive anode/electrolyte boundary layer is crucial for achieving polishing. A finite amount of copper is required to be anodically dissolved to create the boundary layer of the appropriate thickness for effective electropolishing of a given hillock. This is a significant consideration in the application of electropolishing for planarization of thin films where the disparity in the topography is significant in proportion to the thickness of the film. Here electropolishing is shown to effectively remove the bulk of electrodeposited copper layers used in ultralarge scale integration (ULSI) metallization schemes without application of mechanical force and to planarize local topography. Efficient polishing can be achieved under galvanostatic conditions (i.e., constant current between the wafer and a counter electrode). Anodic transient studies indicated that the mechanism of formation of the boundary layer (in mass-transport controlled regime) is determined by the diffusive transport of an acceptor species to the anode/electrolyte interface. Effects of changes in current density and rotational speed of wafer on the extent of planarization have been determined. Under optimal galvanostatic and hydrodynamic conditions, the disparity in the topography over wide trenches adjacent to dense features decreased by 60%. © 2002 The Electrochemical Society. All rights reserved." @default.
- W1972995554 created "2016-06-24" @default.
- W1972995554 creator A5009286237 @default.
- W1972995554 creator A5025600931 @default.
- W1972995554 creator A5033690499 @default.
- W1972995554 creator A5071080153 @default.
- W1972995554 date "2003-01-01" @default.
- W1972995554 modified "2023-10-12" @default.
- W1972995554 title "Planarization of Copper Thin Films by Electropolishing in Phosphoric Acid for ULSI Applications" @default.
- W1972995554 cites W1522746081 @default.
- W1972995554 cites W1782730075 @default.
- W1972995554 cites W1860724208 @default.
- W1972995554 cites W2027228089 @default.
- W1972995554 cites W2036732532 @default.
- W1972995554 cites W2043522014 @default.
- W1972995554 cites W2094863339 @default.
- W1972995554 cites W2113238227 @default.
- W1972995554 cites W2124577058 @default.
- W1972995554 cites W4205176502 @default.
- W1972995554 cites W4256145591 @default.
- W1972995554 doi "https://doi.org/10.1149/1.1523415" @default.
- W1972995554 hasPublicationYear "2003" @default.
- W1972995554 type Work @default.
- W1972995554 sameAs 1972995554 @default.
- W1972995554 citedByCount "55" @default.
- W1972995554 countsByYear W19729955542012 @default.
- W1972995554 countsByYear W19729955542013 @default.
- W1972995554 countsByYear W19729955542014 @default.
- W1972995554 countsByYear W19729955542018 @default.
- W1972995554 countsByYear W19729955542019 @default.
- W1972995554 countsByYear W19729955542021 @default.
- W1972995554 countsByYear W19729955542022 @default.
- W1972995554 crossrefType "journal-article" @default.
- W1972995554 hasAuthorship W1972995554A5009286237 @default.
- W1972995554 hasAuthorship W1972995554A5025600931 @default.
- W1972995554 hasAuthorship W1972995554A5033690499 @default.
- W1972995554 hasAuthorship W1972995554A5071080153 @default.
- W1972995554 hasConcept C121332964 @default.
- W1972995554 hasConcept C138113353 @default.
- W1972995554 hasConcept C147789679 @default.
- W1972995554 hasConcept C159985019 @default.
- W1972995554 hasConcept C160671074 @default.
- W1972995554 hasConcept C171250308 @default.
- W1972995554 hasConcept C17525397 @default.
- W1972995554 hasConcept C180088628 @default.
- W1972995554 hasConcept C185592680 @default.
- W1972995554 hasConcept C191897082 @default.
- W1972995554 hasConcept C192562407 @default.
- W1972995554 hasConcept C207740977 @default.
- W1972995554 hasConcept C2777848306 @default.
- W1972995554 hasConcept C2779227376 @default.
- W1972995554 hasConcept C544778455 @default.
- W1972995554 hasConcept C62520636 @default.
- W1972995554 hasConcept C68801617 @default.
- W1972995554 hasConcept C89395315 @default.
- W1972995554 hasConceptScore W1972995554C121332964 @default.
- W1972995554 hasConceptScore W1972995554C138113353 @default.
- W1972995554 hasConceptScore W1972995554C147789679 @default.
- W1972995554 hasConceptScore W1972995554C159985019 @default.
- W1972995554 hasConceptScore W1972995554C160671074 @default.
- W1972995554 hasConceptScore W1972995554C171250308 @default.
- W1972995554 hasConceptScore W1972995554C17525397 @default.
- W1972995554 hasConceptScore W1972995554C180088628 @default.
- W1972995554 hasConceptScore W1972995554C185592680 @default.
- W1972995554 hasConceptScore W1972995554C191897082 @default.
- W1972995554 hasConceptScore W1972995554C192562407 @default.
- W1972995554 hasConceptScore W1972995554C207740977 @default.
- W1972995554 hasConceptScore W1972995554C2777848306 @default.
- W1972995554 hasConceptScore W1972995554C2779227376 @default.
- W1972995554 hasConceptScore W1972995554C544778455 @default.
- W1972995554 hasConceptScore W1972995554C62520636 @default.
- W1972995554 hasConceptScore W1972995554C68801617 @default.
- W1972995554 hasConceptScore W1972995554C89395315 @default.
- W1972995554 hasIssue "1" @default.
- W1972995554 hasLocation W19729955541 @default.
- W1972995554 hasOpenAccess W1972995554 @default.
- W1972995554 hasPrimaryLocation W19729955541 @default.
- W1972995554 hasRelatedWork W180816025 @default.
- W1972995554 hasRelatedWork W1983603153 @default.
- W1972995554 hasRelatedWork W1985417357 @default.
- W1972995554 hasRelatedWork W2058666584 @default.
- W1972995554 hasRelatedWork W2154293465 @default.
- W1972995554 hasRelatedWork W2326754443 @default.
- W1972995554 hasRelatedWork W2378882722 @default.
- W1972995554 hasRelatedWork W2383042868 @default.
- W1972995554 hasRelatedWork W3197067817 @default.
- W1972995554 hasRelatedWork W4237271691 @default.
- W1972995554 hasVolume "150" @default.
- W1972995554 isParatext "false" @default.
- W1972995554 isRetracted "false" @default.
- W1972995554 magId "1972995554" @default.
- W1972995554 workType "article" @default.