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- W1973155357 abstract "CO2 laser-induced melting of heavily doped silicon (>1018 cm−3) was studied using both nanosecond and picosecond laser pulses. Evidence for melting is presented and the duration of the melting was measured at intensities below the damage threshold. Dense plasma formation was observed before melting occurred. The melt durations were considerably longer than reported previously for visible laser pulses of comparable durations, indicating a very deep (≳1 μm) molten layer had been achieved." @default.
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- W1973155357 date "1983-06-01" @default.
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- W1973155357 title "CO2laser‐induced melting of silicon" @default.
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- W1973155357 doi "https://doi.org/10.1063/1.332403" @default.
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