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- W1973286276 abstract "Thin films of crystalline V2O5 were deposited by reactive rf magnetron sputtering from a metallic vanadium target in argon–oxygen gas mixtures at a substrate temperature of 300°C. We found that the orientation direction of V2O5 films could be controlled by changing the oxygen flow ratio. Cyclicvoltammetry measurements for these films revealed that lithium diffused much faster in the a-axis oriented V2O5 film than the b-axis oriented one. The surface morphology of these samples was also observed, however, there was not much difference between them, i.e.; lithium ion diffusion was not dominated by the porosity of the film in this case. We also found that chemical diffusion coefficient of Li along the a-axis of V2O5 was larger than along the b-axis, hence, the lithium ion diffusion in V2O5 film was attributed to the diffusing direction." @default.
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- W1973286276 date "1999-07-01" @default.
- W1973286276 modified "2023-10-14" @default.
- W1973286276 title "Electrochemical evaluation of oriented vanadium oxide films deposited by reactive rf magnetron sputtering" @default.
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- W1973286276 doi "https://doi.org/10.1016/s0167-2738(99)00022-3" @default.
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