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- W1973514567 abstract "Abstract Hard vanadium oxycarbide thin films were prepared by conventional atmospheric pressure chemical vapour deposition. As the precursor, vanadium(m) acetylacetonate was used, and low carbon steel and stainless steel were used as substrates. A reducing atmosphere of H2 was chosen and heating was performed at a rate of 40°C min−1 with two isotherms of 1 h at 500°C and 1000°C. The mechanical properties of the coatings were evaluated by hardness measurements and scratch tests. During the first isotherm, surface activation and nucleation of the deposit occurred, with the formation of a non-homogeneous layer, which contained V2O5 and free carbon, as shown by X-ray photoelectron spectroscopy (XPS). Further increments modified the structure to crystalline oxycarbide as major phase. The addition of 1% CH4 to the reactive gas at 1000°C markedly improved the adhesion between coating and substrate. Scanning electron microscopy and XPS showed that the oxygen concentration in the coating was reduced by increasing the reducing capacity of the reactive gas." @default.
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- W1973514567 date "1997-10-01" @default.
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- W1973514567 title "Vanadium oxicarbide thin films prepared by conventional chemical vapor deposition from vanadyl acetylacetonate" @default.
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- W1973514567 doi "https://doi.org/10.1016/s0257-8972(97)00429-5" @default.
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