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- W1973788924 abstract "After an exhaustive reevaluation of the contact printing processes, photoresist sticking to the photomask surface is identified as the principal cause of patterning defects and a preventive measure is developed. This process, called surface conversion for antisticking (SURCAS), facilitates a reduction in defect density by about one‐fourth compared to conventional contact printing. This technique opens the way for improvement of current LSI fabrication, and moreover should be useful in ultrafine pattern lithography down to 1 μm in the near future." @default.
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- W1973788924 date "1981-01-01" @default.
- W1973788924 modified "2023-09-26" @default.
- W1973788924 title "Surface Conversion for Antisticking to Reduce Patterning Defects in Photolithography" @default.
- W1973788924 doi "https://doi.org/10.1149/1.2127364" @default.
- W1973788924 hasPublicationYear "1981" @default.
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