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• W1974134045 abstract "Secondary ion mass spectroscopy (SIMS) has been used to measure the diffusion of deuterium in hydrogenated amorphous silicon. For a film deposited in a dc glow discharge in SiH4 at a substrate temperature of 315 °C, the diffusion data fits D (T) =1.17×10−2 exp(−1.53 eV/kT) cm2/s. This result implies that degradation of these films due to hydrogen out‐diffusion at 100 °C will not be significant until after more than 104 years." @default.
• W1974134045 created "2016-06-24" @default.
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• W1974134045 date "1978-07-01" @default.
• W1974134045 modified "2023-10-02" @default.
• W1974134045 title "A SIMS analysis of deuterium diffusion in hydrogenated amorphous silicon" @default.
• W1974134045 cites W1964500170 @default.
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• W1974134045 doi "https://doi.org/10.1063/1.90153" @default.
• W1974134045 hasPublicationYear "1978" @default.
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