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- W1974246300 abstract "In the field of semiconductor materials characterization, interest has shifted in recent years from bulk problems to surfaces and thin films, and from average composition to three-dimensional concentration profiles. This paper reviews nine major methods available today for the determination of surface and thin film composition, placing particular emphasis on basic principles and up-to-date instrumentation. Major considerations that determine the choice of a given method include: area and depth to be sampled; sensitivity, resolution and reproducibility; number of elements to be detected; and equipment price. To illustrate the capabilities and limitations of these methods, a number of practical examples are presented. Finally, the nine major methods are compared in terms of the most important practical parameters." @default.
- W1974246300 created "2016-06-24" @default.
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- W1974246300 date "1976-01-01" @default.
- W1974246300 modified "2023-09-26" @default.
- W1974246300 title "Surface and thin film analysis of semiconductor materials" @default.
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- W1974246300 doi "https://doi.org/10.1016/0040-6090(76)90356-4" @default.
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