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- W1974332226 abstract "In this study, a hollow optical waveguide with omni-directional reflectors in silicon-based materials was design, fabricated and characterized. By using dry etching technique, plasma-enhanced chemical vapor deposition for Si/SiO2 thin films and covering another wafer with omni-directional reflector together, the waveguides can be formed with an air core of 1.2microm x 1.3microm. A uniform propagation loss of the waveguide to be around 1.7dB/cm for C+L band was found for the TE and TM modes. Polarization-independent hollow optical waveguides were obtained with the hollow waveguide structure." @default.
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- W1974332226 date "2004-01-01" @default.
- W1974332226 modified "2023-09-23" @default.
- W1974332226 title "Semiconductor hollow optical waveguides formed by omni-directional reflectors" @default.
- W1974332226 doi "https://doi.org/10.1364/opex.12.006589" @default.
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