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- W197451851 abstract "Fluorine implantation increases minority-carrier lifetime in silicon by factor of 100, enhancing power efficiency in MOS applications. Implantation does not increase microdefects at silicon surface when thin oxide layers are grown, and process gathers existing impurities near surface without adversely affecting MOS electrical parameters. With these advantages, fluorine may be left on wafer surfaces after processing." @default.
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- W197451851 date "1981-01-01" @default.
- W197451851 modified "2023-09-23" @default.
- W197451851 title "Improving MOS minority-carrier lifetime" @default.
- W197451851 hasPublicationYear "1981" @default.
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