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- W1974520797 abstract "Abstract Metal‐organic precursors of Zr and Hf with excellent vaporization characteristics and low decomposition temperatures are reported. The new mixed alkoxide precursors [Zr(O t Bu) 2 (tbaoac) 2 ] (1) and [Hf(O t Bu) 2 (tbaoac) 2 ] ( 2 ) were synthesized by facile alcohol‐exchange reactions between [M(O i Pr) 2 (L) 2 ] and tert ‐butanol [M = Zr, Hf; L = tert ‐butylacetoacetate (tbaoac)]. The six‐coordinated monomeric compounds are volatile, stable in solution, and less sensitive to air and moisture compared to parent alkoxides such as [Zr(O t Bu) 4 ] and [Hf(O t Bu) 4 ]. It was possible to grow ZrO 2 and HfO 2 at low deposition temperatures, and the films were characterized by X‐ray diffraction ( XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), and Rutherford back scattering (RBS) analysis. [Zr(O t Bu) 2 (tbaoac) 2 ], evaluated in a multiwafer planetary MOCVD reactor combined with a liquid delivery system, yielded ZrO 2 films that show promise for gate oxide applications." @default.
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- W1974520797 date "2006-03-01" @default.
- W1974520797 modified "2023-10-18" @default.
- W1974520797 title "MOCVD of ZrO2 and HfO2 Thin Films from Modified Monomeric Precursors" @default.
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- W1974520797 doi "https://doi.org/10.1002/cvde.200506394" @default.
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