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• W1974605423 abstract "A solution to the problems of roll-to-roll lithography on flexible substrates is presented. We have developed a roll-toroll imprint lithography technique to fabricate active matrix transistor backplanes on flexible webs of polyimide that have a blanket material stack of metals, dielectrics, and semiconductors. Imprint lithography produces a multi-level 3- dimensional mask that is then successively etched to pattern the underlying layers into the desired structures. This process, Self-Aligned Imprint Lithography (SAIL), solves the layer-to-layer alignment problem because all masking levels are created with one imprint step. The processes and equipment required for complete roll-to-roll SAIL fabrication will be described. Emphasis will be placed on the advances in the roll-to-roll imprint process which have enabled us to produce working transistor arrays." @default.
• W1974605423 created "2016-06-24" @default.
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• W1974605423 date "2010-03-11" @default.
• W1974605423 modified "2023-10-12" @default.
• W1974605423 title "Advances in roll-to-roll imprint lithography for display applications" @default.
• W1974605423 doi "https://doi.org/10.1117/12.852268" @default.
• W1974605423 hasPublicationYear "2010" @default.
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