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- W1974746852 abstract "Thin epitaxial Si1-xGex layers were grown on Si(001) substrates and analysed with transmission electron microscopy. We show that the critical thickness for perfect two-dimensional pseudomorphic Si1-xGex layer growth depends on two different mechanisms for strain relief. For low Ge concentrations (x<50%) the critical thickness is determined by the formation of misfit dislocations, whereas for high Ge concentrations it is rather governed by the formation of Stranski-Krastanov islands. In the concentration range between 50% and 60% both mechanisms become equally likely. We show that the critical Stranski-Krastanov thickness increases with decreasing lattice mismatch, in agreement with recent theoretical predictions." @default.
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- W1974746852 date "1994-10-01" @default.
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- W1974746852 title "Considerations about the critical thickness for pseudomorphic Si1-xGex growth on Si(001)" @default.
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- W1974746852 doi "https://doi.org/10.1016/0022-0248(94)90055-8" @default.
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