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- W1974931175 abstract "Abstract Blister formation due to multi- and single energy He+ ions implanted in Nb-1%(wt)-Zr has been investigated by scanning electron microscopy. Foils implanted at room temperature to a concentration of 2 × 10 28 He/m3 showed blistering whereas in foils with a concentration of 1028 He/m3 the blisters were only observed after annealing at 950°C for 2 h. It has been found that the blister size increases with increase in ion implantation energy, anneal temperature and, in general, anneal period. However, beyond a certain anneal period blister sizes do not increase with anneal period; they can even become smaller. The multi-energy implantation produces smaller blisters compared with those of the single ion energy imimplant. The blister skin thicknesses are approximately the same as the projected ranges of He+ ions in foils, and the blister formation may be due to the excessive gas pressure build up in the maximum gas concentration region of an implant foil." @default.
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- W1974931175 date "1981-01-01" @default.
- W1974931175 modified "2023-09-27" @default.
- W1974931175 title "Blisters in He+ ion implanted Nb-1%Zr alloy" @default.
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- W1974931175 doi "https://doi.org/10.1016/0022-3115(81)90222-1" @default.
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