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• W1975016657 abstract "Site-specific excitation and fragmentation following Si : 2p photoexcitation of 1-trifluorosilyl-2-trimethylsilylethane (F3SiCH2CH2Si(CH3)3, FSMSE), in which two Si sites are separated by two -CH2- groups, have been studied in the vapour phase by means of synchrotron radiation. In contrast to C13SiSi(CH3)3 and F3SiCH2Si(CH3)3, the occurrence of different chemical shifts for the two Si sites (site-specific excitation) is clearly revealed in the total photoionization efficiency curve of FSMSE. The site-specific fragmentation is moderately observed in the mass spectra and occurs selectively around the Si atom where the photoexcitation has taken place. It is considered that the site-specific excitation and fragmentation are observed in molecules in which the two Si sites are located far from each other and, thus, electron migration between the two Si-containing groups [SiF3 and Si(CH3)3] is not effective. Published by Elsevier Science B.V." @default.
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• W1975016657 date "1997-12-01" @default.
• W1975016657 modified "2023-10-11" @default.
• W1975016657 title "Fragmentation of F3SiCH2CH2Si(CH3)3 vapour following Si:2p core-level photoexcitation. A search for a site-specific process in complex molecules" @default.
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• W1975016657 doi "https://doi.org/10.1016/s0168-1176(97)00144-4" @default.
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