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- W1975019521 abstract "Galvanostatic measurements, conducted using a novel electrochemical chemical mechanical planaritation tool, revealed surface passivation layers on copper-coated silicon wafers using benzotriazole (BTAH), ammonium salicylate, maleic acid, malonic acid, and 3-methyl-2-oxazolidinone. Measurements conducted in 249.5 g/L hydroxylamine sulfate containing 250 ppm of BTAH at pH 3.5 exhibited bilayer formation with associated measured passivation rates of 0.313/s and 0.00427/s. Similar rates were measured for ammonium salicylate and maleic acid." @default.
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- W1975019521 date "2004-01-01" @default.
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- W1975019521 title "Electrochemical Measurements of Passivation Bilayers on Copper in a CMP System" @default.
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- W1975019521 doi "https://doi.org/10.1149/1.1793731" @default.
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