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• W1975046998 abstract "Single-phase rutile-type TiO2 thin films with a high refractive index (n) and a low extinction coefficient (k) prepared on glass are expected to improve the performance of anti-reflection coatings. In this study, TiO2 thin films were prepared by the pulsed laser deposition (PLD) method at temperatures ranging from room temperature to 600 °C under an oxygen partial pressure of 1–9 Pa or a 10−5 Pa vacuum, and their crystal structure, microstructure and optical properties were investigated. A single-phase rutile-type TiO2 thin film was successfully prepared on a glass substrate by depositing at room temperature in a vacuum followed by post-annealing at 450 °C in air. A nanocrystalline oxygen-deficient phase in the as-deposited films plays an important role in the formation of the single rutile phase during post-annealing. The single-phase rutile-type TiO2 thin films showed excellent optical properties, with n = 3.14 and k < 0.05 at λ = 400 nm." @default.
• W1975046998 created "2016-06-24" @default.
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• W1975046998 date "2015-08-01" @default.
• W1975046998 modified "2023-09-30" @default.
• W1975046998 title "Low-temperature preparation of high-n TiO2 thin film on glass by pulsed laser deposition" @default.
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• W1975046998 doi "https://doi.org/10.1016/j.apsusc.2015.04.125" @default.
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