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• W1975062125 abstract "Nanoparticles were formed by 100-keV tungsten-ion implantation in unpolished glassy carbon substrates at different fluences. The implanted samples were analyzed by Rutherford backscattering spectrometry, X-ray photoelectron spectroscopy, hydrodynamic voltammetry using a rotating disk electrode, and field emission scanning electron microscopy. A significant sputtering effect changed the depth profile during the course of irradiation and limited the amount of tungsten that could be retained on the substrate, which saturated at a fluence of around 6 × 1016 ions/cm2. The observed depth-profile change and saturation can be explained quantitatively by the calculated sputtering yield. The nanoparticles of tungsten carbides with diameters of around 16 nm were dispersed uniformly on the surface." @default.
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• W1975062125 date "2013-01-01" @default.
• W1975062125 modified "2023-10-01" @default.
• W1975062125 title "Nanoparticle Formation by Tungsten Ion Implantation in Glassy Carbon" @default.
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• W1975062125 doi "https://doi.org/10.14723/tmrsj.38.81" @default.
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