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- W1975126054 abstract "This article deals with the different mechanisms responsible for core-level broadening as observed by high-resolution photoelectron spectroscopy. Based on a comparative study for three different Si(111) surfaces the fundamental questions of symmetric or asymmetric broadening and scattered electron background are discussed together with the relative contribution of Lorentzian and Gaussian widths to the final core-level broadening. The variation of core-level broadening with temperature is studied at very low temperatures T∼30–300 K in order to evaluate the contribution of phonon broadening for the silicon bulk and the surface components." @default.
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- W1975126054 date "1999-06-01" @default.
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- W1975126054 title "Core-level broadening mechanisms at silicon surfaces" @default.
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- W1975126054 doi "https://doi.org/10.1016/s0368-2048(98)00492-7" @default.
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