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- W1975789786 abstract "Abstract A 6 cm in diameter Ga-doped Ge 0.98 Si 0.02 crystal was grown using the vertical Bridgman method with a submerged baffle. After 3 cm of growth, the baffle was removed and the solidification continued in conventional Bridgman configuration. The composition of Si and Ge was measured using electron probe micro-analysis (EPMA). The micro-structure pattern was revealed by etching. The advantages of using the baffle for growth of Si–Ge alloys is discussed." @default.
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- W1975789786 date "2000-04-01" @default.
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- W1975789786 title "Growth of Ga-doped Ge0.98Si0.02 by vertical Bridgman with a baffle" @default.
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- W1975789786 doi "https://doi.org/10.1016/s0022-0248(99)00825-8" @default.
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