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- W1976061253 abstract "It is demonstrated that solar cells fabricated using plasma-deposited a-Si:H alloys can be seriously degraded by the incorporation of certain impurities during deposition of the a-Si:H materials. Nominally intrinsic layers are adversely affected by the addition to the plasma of air, N2+O2 mixtures (although by neither N2 nor O2 separately), PH3, or SiH3Cl (monochlorosilane). For example, the conversion efficiency of Pd/p-i-n solar cells is lowered from 3.1% to 1.5% by the presence in the plasma of 3000 ppm air during deposition of the i-layer. In this case modification of the a-Si:H gap-state density owing to synergistic effects of oxygen and nitrogen in the plasma leads to a collapse of the space-charge region and a reduction of the μτ product for holes. The deleterious effects on device performance of phosphine and monochlorosilane are also discussed." @default.
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- W1976061253 date "1981-10-01" @default.
- W1976061253 modified "2023-10-16" @default.
- W1976061253 title "Impurity effects in <i>a</i>-Si:H solar cells due to air, oxygen, nitrogen, phosphine, or monochlorosilane in the plasma" @default.
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- W1976061253 doi "https://doi.org/10.1063/1.328576" @default.
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