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- W1976067350 abstract "MgO (100) textured films can be prepared by reactive facing targets sputtering at room temperature when they were deposited on (100) oriented Fe buffer layers. This method allows fabrication of perpendicular magnetic tunnel junction (p-MTJ) with MgO tunneling barrier layer and rare-earth transition metal amorphous alloy (RE-TM alloy) thin films as perpendicularly magnetized layers. The 3nm-thick MgO tunneling barrier layer in p-MTJ multilayer prepared on a glass substrate revealed (100) crystalline orientation. Anomalous Hall effect measurement clarified that the 3nm-thick Fe buffer layers attached to the two end of MgO tunneling barrier layer magnetized vertically to the film plane because of the strong exchange coupling with RE-TM alloy layers. TMR ratio of 31% was observed in the multilayered p-MTJ element." @default.
- W1976067350 created "2016-06-24" @default.
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- W1976067350 date "2008-01-01" @default.
- W1976067350 modified "2023-10-04" @default.
- W1976067350 title "Preparation of Perpendicular Magnetic Tunnel Junction with MgO(100) Textured Film Sputter-deposited at Room Temperature" @default.
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- W1976067350 doi "https://doi.org/10.3379/msjmag.32.329" @default.
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