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- W1976438149 abstract "150–300 keV Hg+ was implanted into Li0.16Na0.84NbO3 with an increment of 50 keV. The depth distribution of the implanted Hg+ was measured by Rutherford backscattering of 2.1 MeV 4He2+. The depth distributions were compared with the TRIM'89 simulation. The result shows that the experimental data are found to be in good agreement with the TRIM'89 prediction. Also the range profile moments are compared with TRIM'89, PRAL and our calculation procedure based on Biersack's angular diffusion model. The stability of Hg+ in Li0.16Na0.84NbO3 is discussed." @default.
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- W1976438149 date "1992-08-01" @default.
- W1976438149 modified "2023-10-15" @default.
- W1976438149 title "Depth distribution and stability of implanted Hg ions in Li0.16Na0.84NbO3" @default.
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- W1976438149 doi "https://doi.org/10.1016/0375-9601(92)90609-p" @default.
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