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• W1976820902 abstract "In this work Raman scattering and optical-band-gap measurements have been carried out in glow-discharge-produced a-${mathrm{Si}}_{mathit{x}}$:${mathit{Y}}_{1mathrm{ensuremath{-}}mathit{x}}$:H alloys, where Y is B, N, O, and P. The structural order parameters from the Raman spectra and the optical band gap as a function of x show one kind of behavior for impurity levels up to 2 at. % and a different linear behavior for levels in excess of 2 at. %. Furthermore, the magnitude of the change in those parameters follows a similar trend for all the impurities investigated. The largest effect is observed for B; the effect of N is similar but somewhat less than for B; the effect of oxygen is substantially less than of N; P has the least effect but not much less than oxygen. From the present study it is suggested that there are two possible sources that could account for the structural changes observed by the Raman and optical-band-gap measurements. One is the difference in the atomic size of the impurity element compared with that of silicon, and the other is the change in the local coordination imposed by the number of bonds of the impurity atom. The linear relationship of the Raman parameters and the impurity concentration in the alloying regime (xensuremath{gtrsim}0.02) allows a fast, inexpensive, and nondestructive quantitative method for chemical analysis in alloyed thin films prepared on any type of substrate." @default.
• W1976820902 created "2016-06-24" @default.
• W1976820902 creator A5066840143 @default.
• W1976820902 date "1990-11-15" @default.
• W1976820902 modified "2023-09-26" @default.
• W1976820902 title "Raman scattering and optical-band-gap measurements ina-Six:Y1−x:H alloys" @default.
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• W1976820902 doi "https://doi.org/10.1103/physrevb.42.9508" @default.
• W1976820902 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/9995189" @default.
• W1976820902 hasPublicationYear "1990" @default.
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