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- W1976985229 abstract "A closed-form, accurate, and easy to fit model for crosslinking of chemically amplified acid-hardened resist (Shipley SNR-248) is presented and used to compare effects of e-beam and optical exposure. In this model, the saturation of the acid-catalyzed crosslinking reaction during the postexposure bake is assumed to be caused by the ‘‘cage-effect’’ mechanism–restriction of segmental diffusion of the polymer chains as the reaction progress. [D. Seligson, S. Das, H. Gaw, and P. Pianetta, J. Vac. Sci. Technol. B 6, 2303 (1988)]. To model this cage effect, the rate coefficient in the rate equation is assumed to be a linearly decreasing function of the extent of the crosslinking with the asymptotic saturation level of the crosslinking as a parameter. According to this cage-effect model, the order of the acid catalyst in the crosslinking reaction of e-beam exposed SNR-248 resists m is 1.37, which is similar to that of the deep-ultraviolet (DUV) exposed resists (1.42). However, in e-beam exposed resists, some crosslinking is induced by the electrons during exposure. As a result, this initial crosslinking might contribute to a slightly higher activation energy (0.866 versus 0.694 eV). The equilibrium conversions of the melamine crosslinking sites are also different between the two exposure types. The power of the acid concentration n in the expression for the equilibrium conversion for e-beam exposed resists is ∼0.49 whereas in DUV exposed resists, n is 1.1. There is also a difference in the activation energies of the equilibrium constants which suggested the cage effect might have a stronger influence on the backward reaction in e-beam exposed resists." @default.
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- W1976985229 date "1992-11-01" @default.
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- W1976985229 title "Practical cage-effect model for crosslinking in a negative chemically amplified resist and its use in comparing e-beam and optical exposure" @default.
- W1976985229 doi "https://doi.org/10.1116/1.586328" @default.
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