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• W1977048443 abstract "Abstract Low temperature deposition of oxide films related to Bi-Sr-Ca-Cu-O superconductors has been investigated by using an apparatus originally designed for plasma chemical vapor deposition at moderately high pressures. Crystalline Bi2O3 film was obtained at a substrate temperature of 400°C from triphenylbismuth. Amorphous films as-deposited at 400°C from Ca(DPM)2, Sr(DPM)2, and Cu(DPM)2, were annealed at 400°C in air to be crystalline films of CaCO3, SrCO3, and CuO, respectively. The effect of oxygen partial pressure on the crystallization of as-deposited films was examined with respect to CaCO3 film to verify the effectiveness of elevated oxygen partial pressure for improving the film crystallinity. Linear relationships were obtained between the deposition time and film thickness. Preliminary data for the preparation of superconducting film by annealing a layered oxide film are also presented." @default.
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• W1977048443 date "1990-07-01" @default.
• W1977048443 modified "2023-10-04" @default.
• W1977048443 title "Deposition of Bi, Sr, Ca, and Cu Oxide Films by RF Glow Discharge Generated at Relatively High Pressure" @default.
• W1977048443 cites W1977701433 @default.
• W1977048443 cites W2013100187 @default.
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• W1977048443 doi "https://doi.org/10.1080/00268949008031762" @default.
• W1977048443 hasPublicationYear "1990" @default.
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