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- W1977476022 abstract "Recently, the inclined UV lithography technology based on SU-8 negative thick photoresists has been mature andattractive due to the in-depth research of SU-8. With the increasing demand for the high-fidelity oblique structures ofSU-8, the simulation of inclined UV lithography becomes more important. Based on the Fresnel-Kirchhoff diffractiontheory, a simple light intensity distribution model is established in this paper by the Fresnel approximation and paraxialapproximation solutions to simulate the 2D inclined UV lithography. The refraction and reflection at the air/photoresistinterface and the reflection at the substrate surface are integrally considered in the modeling. The oblique SU-8 structureswere fabricated on both glass wafers and silicon wafers, which show different reflection-induced profiles afterdevelopment. According to the comparison of the simulation and experimental results, it is demonstrated that thesubstrate reflection has significant influence to the inclined UV lithography, and the validity of the model is also verified." @default.
- W1977476022 created "2016-06-24" @default.
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- W1977476022 date "2009-07-03" @default.
- W1977476022 modified "2023-10-16" @default.
- W1977476022 title "The effect from the substrate reflection to the inclined UV lithography of SU-8 photoresist" @default.
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- W1977476022 doi "https://doi.org/10.1117/12.835048" @default.
- W1977476022 hasPublicationYear "2009" @default.
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