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- W1977490088 abstract "Dual-frequency capacitively coupled plasmas (DF-CCPs) have been used to control the ion flux by the high-frequency source and the ion bombardment energy onto the electrode by the low-frequency (LF) source separately. However, an increase in the LF voltage, which extends the maximum ion energy to a higher value, causes the reduction of the bulk plasma length with a subsequent decrease of the plasma density. By using a one-dimensional particle-in-cell/Monte Carlo simulation code, the effect of the magnetic field on a DF-CCP is investigated to find whether the plasma can be sustained during the LF voltage increase. It is found that a low magnetic field can effectively maintain the plasma density and electron temperature constant with respect to the variation of the LF voltage." @default.
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- W1977490088 date "2008-08-22" @default.
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- W1977490088 title "Sustainment of Plasma Density by a Low Magnetic Field in a Dual-Frequency Capacitively Coupled Plasma" @default.
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- W1977490088 doi "https://doi.org/10.1143/jjap.47.7005" @default.
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