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- W1977660465 startingPage "L556" @default.
- W1977660465 abstract "Periodic arrays of submicron Si and Ni dots were fabricated by only irradiating a linearly polarized Nd:YAG pulsed laser to Si and Ni thin films deposited on a silicon dioxide (SiO2) film. The molten film was split and it condensed owing to its surface tensile according to the laser-induced periodic energy density distribution, and fine lines (line and space structures) of Si and Ni were formed periodically. After the formation of fine lines, the sample was rotated by 90°, and irradiated with the laser beam. Periodically aligned submicron Si and Ni dots were fabricated on the SiO2 film." @default.
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- W1977660465 date "2007-06-08" @default.
- W1977660465 modified "2023-09-25" @default.
- W1977660465 title "Periodically Aligned Submicron Dots of Silicon and Nickel Fabricated by Irradiation with Linearly Polarized Nd:YAG Pulsed Laser" @default.
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- W1977660465 doi "https://doi.org/10.1143/jjap.46.l556" @default.
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