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- W1977702008 abstract "Deposition of AIN by metalorganic chemical vapor deposition (MOCVD) with NF 3 and NH 3 as the nitrogen source was conducted at low temperatures (below 500°C). The resultant films were examined by scanning electron microscopy (AES), and secondary ion mass spectrometry (SIMS). Rough, polycrystalline films were produced with NF 3 as the nitrogen source while smooth, featureless films were obtained with NH 3 ." @default.
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- W1977702008 date "1991-09-01" @default.
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- W1977702008 title "Optical properties and electron energy-loss diagnostics of vanadium dioxide thin films" @default.
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- W1977702008 doi "https://doi.org/10.1016/0040-6090(91)90485-g" @default.
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