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- W1977838628 abstract "The current-voltage and time dependent dielectric breakdown characterics of MOS capacitors with various Si-implanted SiO2 layers of 50 nm thickness were measured at inversion and accumulation condition. In comparison with unimplanted SiO2, some implanted SiO2 samples have a higher breakdown voltage and a maximum allowable constant voltage or current stress for a 10-year life-time. The latter suggests the possibility of SiO2 electrical characteristics engineering by Si-implantation." @default.
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- W1977838628 date "1996-10-01" @default.
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- W1977838628 title "Time dependent dielectric breakdown characteristics of MOS capacitors with Si-implanted SiO2" @default.
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- W1977838628 doi "https://doi.org/10.1016/0038-1101(96)00057-3" @default.
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