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- W1977921271 abstract "In the present publication, the effect of the addition of H2 in an atmospheric pressure Townsend Dielectric Barrier Discharge in an atmosphere of N2–C2H4 is examined with an emphasis put on the evaluation of the surface chemistry and growth mechanisms. Scanning Electron Microscopy, Atomic Force Microscopy, X-Ray Photoelectron Spectroscopy and Fourier Transform Infrared Spectroscopy were used to characterize the coatings. For all H2 concentrations, films obtained present high N/C ratio (∼ 0.8) with high NHx and nitrile content. However, when H2 is added in the discharge, nanoparticles/nanorods are formed imbedded in a smooth film. The average size of the nanorods is 100–200 nm in diameter with length from 1 to 10 μm. A growth mechanism is proposed to explain the formation of the nanorods on the surface of the coating in the presence of H2." @default.
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- W1977921271 date "2010-06-01" @default.
- W1977921271 modified "2023-09-30" @default.
- W1977921271 title "Formation of nanoparticles and nanorods in a N2–C2H4–H2 atmospheric pressure dielectric barrier Townsend discharge" @default.
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- W1977921271 doi "https://doi.org/10.1016/j.tsf.2010.01.062" @default.
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