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- W1978049061 abstract "We have studied the temperature programmed decomposition of CH3OH adsorbed on model CuZnO surfaces which have been prepared by evaporating small amounts of Cu onto RF plasma grown ZnO thin films. Desorption products assigned to the decomposition of CH3O(a) and HCOO(a) intermediates on exposed ZnO are observed respectively at 585 K (H2 and CH2O evolved) and 635 K (H2 CO and CO2 evolved). Products from CH3O(a) decomposition on metallic Cu clusters are observed at 410 K (H2 and CH2O). In addition to these results, which are consistent with the previously determined behavior of the separate components, we observe two new phenomena: The CH3OH adsorption step on the Cu clusters does not require pre-exposure of the sample to O2, and large CO2 desorption signals are observed at 510 K and 635 K. The former result is attributed to the spillover of H atoms onto O2− anions of the basic ZnO support, stabilizing the CH3O(a) species which remain on the Cu clusters. The enhanced CO2 desorption peaks are attributed to the decomposition of HCOO(a) species on Cu clusters (the 510 K peak) and at dispersed Cu cation sites on the ZnO surface (the 635 K. peak)." @default.
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- W1978049061 date "1986-08-01" @default.
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- W1978049061 title "Methanol decomposition on oriented thin films" @default.
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- W1978049061 doi "https://doi.org/10.1016/0039-6028(86)90114-7" @default.
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