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- W1978055712 abstract "Thin film SOI is a key technology for wireless and RF applications. We demonstrate the successful transfer of a DriftMOS transistor from the 130 nm technology to the 65 nm one on thin SOI. The process option introduced in this node enables to achieve high device performance: due to the new well patterning strategy, the main transistor figure of merit is improved." @default.
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- W1978055712 date "2007-10-01" @default.
- W1978055712 modified "2023-09-30" @default.
- W1978055712 title "RF Power NLDMOS Technology Transfer Strategy from the 130nm to the 65nm node on thin SOI" @default.
- W1978055712 cites W2105732285 @default.
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- W1978055712 doi "https://doi.org/10.1109/soi.2007.4357852" @default.
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