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- W1978192893 abstract "A novel air-gap capacitance-Voltage (C-V) method is introduced. This method is powerful tool for characterizing electrical properties of free or ultrathin-insulator-covered surfaces for III-V semiconductors. Air-gap C-V characteristics of p-InP surfaces with and without natural oxide are reported for the first time. Unexpectedly, the surface with natural oxide gives relatively low-density surface states. Surfaces covered with ultrathin Al 2 O 3 film were also measured, indicating the importance for further investigation and optimization of surface process." @default.
- W1978192893 created "2016-06-24" @default.
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- W1978192893 date "2010-05-01" @default.
- W1978192893 modified "2023-09-28" @default.
- W1978192893 title "Air-gap capacitance-Voltage analysis of p-InP surfaces" @default.
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- W1978192893 doi "https://doi.org/10.1109/iciprm.2010.5516369" @default.
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