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• W1978249425 abstract "Al2O3 and TiO2 thin films were deposited by atomic layer deposition at 80–250 °C on various polymeric substrates such as polymethylmethacrylate (PMMA), polyetheretherketone (PEEK), polytetrafluoroethylene (PTFE) and ethylenetetrafluoroethylene (ETFE). The films were studied with FESEM, EDX, XRD, contact angle measurements and adhesion tests. The film growth rates on the thermoplastics were close to the corresponding growth rates on Si substrates. The adhesion of the films was good on PEEK and poor on PTFE. All coated surfaces showed lower water contact angles than the uncoated thermoplastics. Furthermore, the water contact angles on all TiO2-coated surfaces decreased upon UV illumination, most efficiently with crystalline TiO2 coatings." @default.
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• W1978249425 date "2008-11-01" @default.
• W1978249425 modified "2023-10-02" @default.
• W1978249425 title "Surface modification of thermoplastics by atomic layer deposition of Al2O3 and TiO2 thin films" @default.
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• W1978249425 doi "https://doi.org/10.1016/j.eurpolymj.2008.09.005" @default.
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