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- W1978319953 abstract "Large-area SiNWs has been successfully fabricated through one-step metal-assisted chemical etching process at room temperature. The effects of key fabrication parameters (AgNO 3 concentration, Fe (NO 3 ) 3 concentration, and etching time) on the nanostructure SiNWs were carefully investigated by SEM, TEM, respectively. The results show that AgNO 3 concentration and Fe (NO 3 ) 3 concentration play important roles to the lengths and arrangements of SiNWs arrays in one-step MACE. The morphological transition of Si surfaces from solid nanowires to porous nanowires can be found with increasing AgNO 3 concentration and Fe (NO 3 ) 3 concentration, which indicates that the re-dissolved Ag + would work as the main oxidative species for oxidizing the silicon substrate and forming SiNWs in the HF/ AgNO 3 / Fe (NO 3 ) 3 etching system. The length of SiNWs is increased with increasing AgNO 3 concentration from 0.005 mol/L to 0.02 mol/L and etching time, the chemical polish phoenomenon can be observed when the Fe (NO 3 ) 3 concentration increases to 0.5 mol/L. A novel mechanism is proposed to explain the formation of SiNWs in HF/ AgNO 3 / Fe (NO 3 ) 3 solution." @default.
- W1978319953 created "2016-06-24" @default.
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- W1978319953 date "2014-12-01" @default.
- W1978319953 modified "2023-09-27" @default.
- W1978319953 title "Influence of Fabrication Parameter on the Nanostructure of SiNWs under HF/AgNO<sub>3</sub>/Fe(NO<sub>3</sub>)<sub>3</sub> Etching System" @default.
- W1978319953 doi "https://doi.org/10.4028/www.scientific.net/msf.809-810.93" @default.
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