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- W1978330812 abstract "The focus window of various topographies and substrate (borophosphosilicategass, plasma enhanced oxide and Al/Si/Cu) is discussed in this paper. Also the electric test data and Cp yield with different focus are introduced. Finally, the usable depth of focus, auto focus system and simulation model are applied to describe the difference between machine and process best focus." @default.
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- W1978330812 date "1997-08-25" @default.
- W1978330812 modified "2023-09-27" @default.
- W1978330812 title "<title>Comparison of best process focus and machine focus</title>" @default.
- W1978330812 doi "https://doi.org/10.1117/12.284644" @default.
- W1978330812 hasPublicationYear "1997" @default.
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