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• W1978359056 abstract "The development of gate systems suitable for high κ dielectrics is critical to the advancement of complementary metal-oxide-semiconductor (CMOS) devices. Both the effective work function and material stability are key parameters to these systems. A systematic study of metal gates of the composition HfxSi1-x (0.25 ≤ x ≤ 1) is demonstrated here, including XPS, XRD and four point probe measurements. The effective work function of each material is evaluated and it is shown that it can be tuned from 4.5 to less than 4.0 eV. Suitable work functions for n-channel metal-oxide-semiconductor applications (4.05 ± 0.2 eV) were achieved using hafnium rich compositions; however, XPS and diffraction measurements confirmed that these materials demonstrated a high propensity to oxidise, causing the reduction of the underlying oxides, making them unsuitable for commercial application." @default.
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• W1978359056 date "2013-01-18" @default.
• W1978359056 modified "2023-10-16" @default.
• W1978359056 title "Novel metal gates for high κ applications" @default.
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• W1978359056 doi "https://doi.org/10.1063/1.4780447" @default.
• W1978359056 hasPublicationYear "2013" @default.
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