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Matches in SemOpenAlex for { <https://semopenalex.org/work/W1978387563> ?p ?o ?g. }

• W1978387563 endingPage "2590" @default.
• W1978387563 startingPage "2588" @default.
• W1978387563 abstract "The influence of the plasma excitation frequency on the growth conditions and the material properties of microcrystalline silicon prepared by plasma enhanced chemical vapor deposition at low deposition temperature is investigated. It is found that an increase of the plasma excitation frequency leads to a simultaneous increase of the growth rate, the grain size, and the Hall mobility of microcrystalline silicon. This is attributed to an effective selective etching of disordered material creating more space to develop crystalline grains, while also more species for faster growth of the crystallites are available." @default.
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• W1978387563 date "1994-11-14" @default.
• W1978387563 modified "2023-09-27" @default.
• W1978387563 title "Improvement of grain size and deposition rate of microcrystalline silicon by use of very high frequency glow discharge" @default.
• W1978387563 cites W1972302135 @default.
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• W1978387563 doi "https://doi.org/10.1063/1.112604" @default.
• W1978387563 hasPublicationYear "1994" @default.
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