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- W1978392815 abstract "To obtain a better understanding of the damage annealing process and dopant defect incorporation and activation we have implanted epitaxially grown 4H-SiC layers with high doses of Al+ ions. Cross- ..." @default.
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- W1978392815 date "2006-10-01" @default.
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- W1978392815 title "Ion implantation damage annealing in 4H-SiC monitored by scanning spreading resistance microscopy" @default.
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- W1978392815 doi "https://doi.org/10.1016/j.tsf.2005.12.211" @default.
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